Nitrogen trifluoride (NF₃) is a colorless, odorless gas at room temperature and pressure. It has the CAS number 7783-54-2 and is used in various industrial applications, primarily in the semiconductor industry for plasma etching and cleaning processes due to its chemical reactivity with silicon-based materials.
Characteristics of Nitrogen Trifluoride:
Chemical Properties:
NF₃ is a strong oxidizing agent.
It reacts with water vapor to form hydrofluoric acid (HF), which is highly corrosive and toxic.
It can decompose when exposed to high temperatures or UV light, producing toxic and corrosive fumes including nitrogen dioxide (NO₂).
Physical Properties:
Boiling point: -129.2°C (-196.6°F)
Melting point: -207°C (-340.6°F)
Density: 3.04 g/L (at 25°C and 1 atm)
Safety Concerns:
NF₃ is non-flammable but can support combustion.
It is potentially harmful if inhaled or if it comes into contact with skin or eyes due to its reactive nature and the products of its decomposition.
It is considered an asphyxiant at high concentrations because it can displace oxygen in the air.
Environmental Impact:
NF₃ is a potent greenhouse gas with a global warming potential over 17,000 times greater than CO₂ over a 100-year time frame.